Microchip patterning technology created

PRINCETON, N.J., Sept. 5 (UPI) -- U.S. engineers have developed a low-cost technology that patterns microchips.

Princeton University engineers said the "fracture-induced structuring" results in the self-formation of periodic lines, or gratings, separated by as few as 60 nanometers. Such features, researchers said, have many uses in optical, biological and electronic devices, including the alignment of liquid crystals in displays.

The process begins by the painting of a thin polymer film onto a rigid plate, such as a silicon wafer. Then, a second plate is placed on top, creating a polymer sandwich that is heated to ensure adhesion. Finally, the two plates are pried apart.

As the film fractures, it automatically breaks into two complementary sets of nanoscale gratings, one on each plate.

The researchers said fracture-induced structuring enables patterning over a much larger area. They have already used the technique to create gratings over several square centimeters, and the patterning of much large areas should be possible, they said.

The technology was created by Professors William Russel and Stephen Chou, with graduate students Leonard Pease III, Paru Deshpande and Ying Wang.

The research is detailed in the online version of the journal Nature Nanotechnology.